New field emission scanning electron microscope ZEISS GeminiSEM 450 introduced
Addressing the highest demands in imaging and analytics from any sample
ZEISS introduces its new field emission scanning electron microscope (FE-SEM) ZEISS GeminiSEM 450. The instrument combines ultrahigh resolution imaging with the capability to perform advanced analytics while maintaining flexibility and ease-of-use.
With ZEISS GeminiSEM 450, users benefit from high resolution, surface sensitive imaging and an optical system that ideally supports them in obtaining the best analytical results – especially when working with low voltages. High-throughput electron backscatter diffraction (EBSD) analysis and low voltage X-ray spectroscopy (EDS) deliver excellent results due to ZEISS Gemini 450’s ability to precisely and independently control spot size and beam current. With the Gemini 2 design, it is possible to always work under optimized conditions as the user can switch seamlessly between imaging and analytical modes at the touch of a button. This makes ZEISS GeminiSEM 450 the ideal platform for the highest demands in imaging and analytical performance.
In addition, ZEISS GeminiSEM 450 has been designed to cater for a broad variety of sample types from classical conductive metals to beam sensitive polymers. In particular the variable pressure technology of ZEISS GeminiSEM 450 reduces charging on non-conductive samples without compromising Inlens detection capabilities and at the same time enables high resolution EDS analysis by minimizing the skirt effect. Based on this design, ZEISS GeminiSEM 450 provides a flexible instrument suited to a broad variety of applications in materials science, industrial labs and life sciences.
“With ZEISS GeminiSEM 450 we have introduced a new FE-SEM flagship for highest performance analytics and ultrahigh resolution. In addition to this product launch, we are also rolling out significant enhancements to both the ZEISS GeminiSEM and ZEISS Sigma families. As an example, the ZEISS Sigma family now benefits from the introduction of the high resolution gun mode that has previously only been available on the ZEISS Gemini series” says Dr. Michael Albiez, head of electron microscopy at ZEISS.
About ZEISS
ZEISS is an internationally leading technology enterprise operating in the optics and optoelectronics industries. ZEISS develops and distributes lithography optics, measuring technology, microscopes, medical technology, eyeglass lenses, camera and cine lenses, binoculars and planetarium technology. With its solutions, the company constantly advances the world of optics and helps shape technological progress. The company is divided up into the six business groups Industrial Metrology, Microscopy, Medical Technology, Vision Care, Consumer Optics and Semiconductor Manufacturing Technology. ZEISS is represented in over 40 countries – with around 30 production sites, over 50 sales and service locations and about 25 research and development facilities. In fiscal year 2013/14 the company generated revenue approximating 4.3 billion euros with just under 25,000 employees. Founded in 1846 in Jena, the company is headquartered in Oberkochen, Germany. Carl Zeiss AG is the strategic management holding company that manages the ZEISS Group. The company is wholly owned by the Carl Zeiss Stiftung (Carl Zeiss Foundation).
Further information at www.zeiss.com
Microscopy
The Microscopy business group is the world's only one-stop manufacturer of light, X-ray and electron microscope systems. The portfolio includes solutions and services both for life sciences and materials research and for industry, education and clinical practice. The business group is headquartered in Jena. Additional production and development sites are located in Oberkochen, Göttingen and Munich in Germany, as well as in Cambridge in the UK, and in Peabody, MA and Pleasanton, CA in the USA. The business group employs a total of over 3,000 people. It generated revenue of 656 million euros in fiscal year 2013/14.